Electronic Grade
Configured for electronics and advanced manufacturing applications where gas quality and controlled composition are important.
Electronic Grade Arsine (AsH₃) in Hydrogen (H₂) gas mixtures are precision specialty-gas blends for semiconductor and advanced electronics applications that require controlled arsine concentration in a hydrogen balance gas.
Electronic Grade Arsine (AsH₃) in Hydrogen (H₂) gas mixture is a controlled blend of arsine with hydrogen as the balance gas. It is intended for advanced electronic manufacturing environments where an arsenic-containing process gas must be delivered at a specified concentration.
AsH₃ is used as an arsenic source in qualifying semiconductor and compound-semiconductor processes. Where hydrogen is already part of the process environment, an AsH₃/H₂ mixture provides arsine in a hydrogen balance gas for controlled delivery.
NextPure offers AsH₃/H₂ mixtures across a stated concentration range of 10 ppm to 10%, with 10L, 16L, 49L and 50L cylinder options. Each supplied mixture includes a Certificate of Analysis (COA), and custom mixtures are available for project-specific requirements.
Final selection should consider concentration, balance gas, cylinder size, connection standard, delivery pressure, compatible wetted materials, analytical requirements, gas detection, the current SDS and facility requirements.
Configured for electronics and advanced manufacturing applications where gas quality and controlled composition are important.
Broad AsH₃ concentration coverage for low-ppm through percent-level requirements.
Available cylinder sizes include 10L, 16L, 49L and 50L.
COA included, with custom mixture configurations available for project review.
Hydrogen is widely used as a carrier and process gas in advanced electronics manufacturing. For a process already designed around hydrogen, AsH₃/H₂ can provide a practical configuration for introducing a controlled arsine concentration while retaining hydrogen as the balance gas.
AsH₃/H₂ is not interchangeable with AsH₃/N₂. The correct balance gas depends on the process recipe, tool design, gas-delivery system, safety strategy and facility standards.
| Specification | Value |
|---|---|
| Product Name | Arsine in Hydrogen Gas Mixture |
| Chemical Formula | AsH₃ / H₂ |
| Balance Gas | Hydrogen (H₂) |
| Concentration Range | 10 ppm – 10% |
| Available Cylinders | 10L, 16L, 49L, 50L |
| Grade | Electronic Grade |
| Certificate | COA Included |
| Applications | Semiconductor, LED, Photovoltaic, Laboratory, MOCVD |
| Custom Mixtures | Available |
Final concentration, cylinder configuration, connection and delivery requirements should be confirmed on the quotation, product specification and COA for the supplied batch.
The AsH₃/H₂ series covers low-ppm through percent-level concentrations. The examples below can be used as product-navigation and inquiry points; final availability should be confirmed for the required cylinder, pressure and connection.
Custom concentrations are available for project review.
AsH₃/H₂ mixtures are relevant to semiconductor and advanced-material processes where a controlled arsine source is specified in a hydrogen-based gas environment. Actual concentration and flow requirements are process- and tool-specific.
Used in semiconductor process environments that require a controlled phosphorus-containing gas source. Mixture concentration should be selected according to the process recipe, delivery system and tool requirements.
Applicable to qualifying MOCVD, epitaxy and compound-semiconductor processes where arsine is specified and hydrogen is used as the balance or carrier gas.
Suitable for qualifying LED and compound-semiconductor process applications that specify arsine-containing mixtures.
Arsine mixtures are used within portions of photovoltaic manufacturing. Required balance gas and concentration depend on the production technology and process design.
Lower-volume cylinders and controlled concentrations can support process development, materials research, equipment qualification and analytical work.
Available for advanced-material programs where the approved process specification calls for arsine diluted in hydrogen.
NextPure lists 10L, 16L, 49L and 50L cylinders for AsH₃/H₂ mixtures. Cylinder selection should account for expected consumption, changeout frequency, cabinet dimensions, valve or connection standard, allowable pressure and site handling requirements.
For semiconductor service, gas-delivery components and wetted materials should be selected for compatibility with the exact mixture and process specification. Connection details should be confirmed before ordering.
A Certificate of Analysis (COA) is included with the supplied product. The COA provides batch-specific information appropriate to the delivered mixture. Customers requiring additional analytical, packaging or documentation requirements should define those requirements during quotation and technical review.
This page separates general product-family information from batch-specific values. Final purchasing decisions should rely on the current quotation, specification, cylinder label, COA and SDS.
Arsine-containing mixtures require professional handling and a gas-delivery system designed for the actual concentration, cylinder pressure and facility requirements. Users should follow the current SDS, cylinder label, site procedures and applicable regulations.
Gas cabinets, valve manifold boxes, compatible regulators and valves, ventilation, gas detection, purge strategy, emergency isolation and trained personnel may form part of a complete installation. Exact controls depend on the mixture, process and local requirements. Website imagery must not be used as a materials-compatibility specification.
AsH₃/H₂ is arsine (AsH₃) blended to a specified concentration with hydrogen (H₂) as the balance gas. It is used where a controlled arsine source is required in a hydrogen-based process environment.
The stated NextPure product-family range is 10 ppm to 10%. Custom mixtures are available for review. Final availability should be confirmed for the required cylinder and connection.
Available cylinder sizes are listed as 10L, 16L, 49L and 50L. The best size depends on consumption, changeout frequency, facility layout and delivery-system requirements.
Yes. COA Included is part of the stated product specification. Batch-specific data should be taken from the COA supplied with the product.
Custom mixtures are available for project review. Provide the target concentration, cylinder size, connection requirement and application when requesting a quotation.
Typical application areas include semiconductor manufacturing, LED, photovoltaic, laboratory and MOCVD-related work. Suitability depends on the specific process specification.
The primary difference is the balance gas. AsH₃/H₂ uses hydrogen, while AsH₃/N₂ uses nitrogen. Selection depends on process chemistry, carrier-gas requirements, tool design, safety systems and facility standards.
Provide the requested AsH₃ concentration, balance gas, cylinder size, valve or connection requirement, delivery conditions, application and any analytical or documentation requirements.
Send us the target concentration, cylinder size, connection requirement and application. NextPure can review standard and custom AsH₃/H₂ mixture requirements.