PH₃ / H₂
Ultra-high purity phosphine diluted in hydrogen for semiconductor, epitaxy and advanced process applications.
NextPure supplies ultra-high purity specialty gas mixtures for semiconductor manufacturing, LED, photovoltaic, research and advanced industrial processes. Mixtures are available in a wide range of concentrations and balance gases to support process, calibration and analytical requirements.
Ultra-high purity phosphine diluted in hydrogen for semiconductor, epitaxy and advanced process applications.
Stable phosphine-in-nitrogen mixtures for process, calibration and analytical applications.
Complete phosphine concentration coverage from low-ppm analytical mixtures to percent-level process mixtures.
High-purity arsine diluted in hydrogen for compound semiconductor and advanced manufacturing applications.
Precision arsine-in-nitrogen mixtures for analytical, calibration and specialty gas applications.
Hydrogen chloride mixtures available with nitrogen or hydrogen balance gas for cleaning, etching and advanced process applications.
Gas mixture concentrations can be prepared for ppm-level calibration through percent-level process requirements.
High-purity source gases and balance gases support demanding semiconductor and advanced manufacturing applications.
The PH₃ family covers a broad concentration range for analytical, calibration and process applications.
Hydrogen and nitrogen balance-gas options are available across key phosphine, arsine and hydrogen chloride series.
Product documentation and certificate-of-analysis support can be supplied according to project requirements.
Custom concentration, cylinder and connection requirements can be reviewed with our technical team.
Tell us the gas species, balance gas, target concentration, cylinder size and connection requirement. NextPure can help define an appropriate gas mixture configuration.